Takachi™

 

The Takachi provides etching capabilities over a variety of materials and substrates. The small footprint, low cost, ease of use and superior performance make the Takachi Series ideal for a wide range of uniform, high quality ICP etch applications serving R&D, FA, prototyping, pilot line and low volume production. The Takachi Series is ideal for numerous technologies such as Failure/Yield Analysis, Photonics, Solid State Lighting, MEMs, and Wireless ICP etch processing.

The Takachi Series provides technology for etch using a high density ICP source with a RF biased lower electrode:

 

  • Takachi ICP (Inductively Coupled Plasma)

产品详情

Handling

The Takachi system utilizes a load lock with manual loading incorporating Plasma-Therm’s highly regarded Shuttlelock® system in a compact, robust and easily maintained form factor.

Productivity Enhancements

  • Process Library: Uses well-established reactor technology that provides reliable performance and is supported with guidance from a continuously evolving process library.
  • Endpoint: Both laser and optical emission spectroscopy endpoint technologies are available to augment processing capability.
  • Data Logging: Simplified data collection for sharing of process monitoring and recipe information.

技术规格

FEATURES

应用领域：

1.三五族化合物半导体

(GaAs / SiC，GaN功率及射频器件，InP器件，InSb锑化物器件)

2.MEMS微机电

3.滤波器器件

4.石英基底的光通讯器件